POWERLASE and EUVA Lead New Phase of Next Generation Semiconductor Research
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POWERLASE will supply lasers to world-leading research institution for use in research into Extreme Ultraviolet Lithography (EUVL)
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The research will be instrumental in the development of an EUVL manufacturing technique, which is likely to supersede current lithography techniques for the high volume manufacturer of semiconductors at 32nmhp and below.
POWERLASE Limited, manufacturers of the world’s most powerful nanosecond Q-switched, diode-pumped solid state (DPSS) lasers, today announces a further purchase of its Starlase AO8 lasers by the Extreme Ultraviolet Lithography System Development Association (EUVA). The lasers will be used by the EUVA for continued research into next generation semiconductor manufacturing.
The EUVA is working to perfect the use of discharge produced plasma (DPP) as a source for Extreme ultraviolet Lithography (EUVL). The POWERLASE lasers will enable the development of the DPP source for lithography steppers, which are used for the fabrication of semiconductors. EUVL is the most likely technology to supersede current lithography techniques for high volume manufacture of semiconductors at 32nmhp and below.
DPP is one of two sources, along with laser produced plasma (LPP), capable of generating the 13.5nm light required for successful EUVL. The Starlase lasers are the only commercial laser capable of producing the high power, high-repetition source used to ignite DPP, creating the vital 13.5nm light and providing a more efficient manufacturing process than current lithography techniques.
Company comments
Dr Samir Ellwi, POWERLASE Vice President of Strategic Technology comments: “The requirement for a viable EUVL technology is becoming increasingly important, as traditional techniques reach the end of their lifespan. As such, we are very pleased to begin a new phase of research with the EUVA. The continued partnership will ensure the deadline for the creation of a 32nm technique is achieved.”
Dr. Kazuaki Hotta at EUVA comments: “POWERLASE are renowned for their work with high quality lasers, which make their lasers the natural choice for our DPP research.”
The deal with EUVA is the latest in a string of partnerships POWERLASE has undertaken in the EUVL sector. The company is currently engaged in research projects with the University of Central Florida (UCF) and University College Dublin (UCD)
About EUVA
The Extreme Ultraviolet Lithography System Development Association (EUVA) was formed in June 2002 to develop EUV lithography technologies that would be used to produce 45nmhp semiconductors. Nine companies from the light source, exposure tool and semiconductor sectors gathered to establish EUVA. EUVA was established under the auspices of METI by the law of the mining and manufacturing technology research association. EUVA project is supported by NEDO.
About Powerlase
POWERLASE Limited is an innovative, independent, high power Laser Company, focused on Diode Pumped Solid State (DPSS) lasers developed for industrial applications primarily for use in the materials processing and microelectronics markets for flat panel displays, microelectronics, automotive and aerospace sectors.
POWERLASE is supported by venture capital from MTI Partners, Deutsche Venture Capital, DJF Esprit LLP, Alice Ventures and FNI Venture Capital.
POWERLASE Limited is ranked as the third fastest growing venture capital-backed company in the UK in the Daily Telegraph 2007 Business Growth Rankings and 21st fastest growing private technology company in the UK by The Sunday Times Tech Track 100 Rankings.
POWERLASE recently won the Manufacturer of the Year for 2007 at the Elektra Awards and The Manufacturer Award for Best Design and Innovation 2007 for the company’s work in the development of laser systems for the manufacture of Flat-Panel Displays.
For further information
Please contact Simon Hilliard or Blaise Hammond at Racepoint UK
Tel: +44 (0) 208 752 3217 / 3211
simon.hilliard@racepointgroup.com / blaise.hammond@racepointgroup.com