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Powerlase and University of Central Florida Achieve World's First in Extreme Ultraviolet Lithography (EUVL) Sources
POWERLASE Limited, manufacturers of the world’s most powerful nanosecond Q-switched, diode-pumped solid state (DPSS) lasers, today announces a major development in the field of Extreme Ultraviolet Lithography (EUVL) with its research partner, the University of Central Florida.
The breakthrough sees the combination of two lasers for the first time in the generation of a Laser Produced Plasma (LPP) EUV light source. The research will develop the EUVL approach into a workable solution for high volume manufacture (HVM) of semiconductor chips.
POWERLASE has provided UCF with two of its kilo Watt-class Starlase lasers for use as a light source in the development of LPP EUVL. The two lasers have been multiplexed together in order to increase the power aimed at the EUV target. EUV power generated at the target has been increased to 23 Watts, compared 10 Watts achieved with one laser. This has the major benefit of increasing the power scalability of the LPP EUV approach. EUV lithography is the most promising technology for producing semiconductors accuracy of 32nm and below.
This is the first time more than one laser has been used in EUVL light source generation. In addition, the conversion efficiency of the laser light into 13.5nm wavelength EUV light from both lasers is similar to when they are used independently of each other. This demonstrates the capacity to add more lasers to the process without lowering the conversion efficiency - a vital element in making EUV a viable HVM solution.
Company comments
Dr Samir Ellwi, POWERLASE Vice President of Strategic Innovations comments: “We are very pleased to have achieved such a breakthrough in the development of LPP-based EUV Lithography. The collaboration with UCF has yielded positive results and our combined research is helping to prove that EUVL is a viable production method for delivering semiconductors with an accuracy of 32nm.”
Professor Martin Richardson, Trustee Chair and Northrop-Grumman Professor of X-ray Photonics at UCF, adds: “The two POWERLASE lasers used in this collaboration have provided an ideal solid-state laser driven plasma source required for EUV lithography. Initial research demonstrated a power of 10 Watts at the EUV target and the addition of a second laser has more than doubled this to 23 Watts, with improvements not only in total output power, but also in power conversion efficiency. A direct scale-up of our current system will permit a five-fold increase in power, with additional lasers.”
Alongside this successful collaboration with UCF, POWERLASE continues to work with leading institutions across the globe. A Project with University College Dublin is examining ion-emissions at EUV source and a research partnership with the Extreme Ultraviolet Lithography Association (EUVA) in Japan is providing lasers and technical expertise to further develop the EUVL approach.
About Powerlase
Powerlase Limited is an innovative, independent, high power Laser Company, focused on Diode Pumped Solid State lasers developed for industrial applications primarily for use in the materials processing and microelectronics markets for flat panel displays, microelectronics, automotive and aerospace sectors.
POWERLASE is supported by venture capital from MTI Partners, Deutsche Venture Capital, Esprit Capital Partners LLP (formerly Cazenove Private Equity), Alice Ventures and FNI Venture Capital.
Powerlase Limited is ranked as the fifth fastest growing venture capital-backed company in the UK in the Daily Telegraph's Business Telegraph Growth Rankings.
About the University of Central Florida
Professor Richardson’s EUV Program is part of the Laser Plasma Laboratory he directs within the College of Optics & Photonics, CREOL & FPCE at the University of Central Florida in Orlando. This Laboratory (www.lpl.creol.ucf.edu) is most well known for developments in lasers and laser plasma science and technologies in several disciplines. It has been developing sources for advanced lithography and x-ray microscopy since it’s inception in 1990. The College of Optics & Photonics the first college of optics, lasers and photonics, grew from the creation of CREOL at UCF in the late 1980’s. It now comprises some 40 faculty, 160 graduate students (250 employees overall) and is one of the largest academic optics institutions in the world. UCF is a rapidly advancing metropolitan university in the US with a student population approaching 50,000. Three of its five primary goals are to achieve international prominence in graduate study and research, to provide international focus to curricula and research programs and to become America’s leading partnership university.
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