POWERLASE Limited, manufacturers of the world’s most powerful nanosecond Q-switched, diode-pumped solid state (DPSS) lasers, today announces the purchase of its innovative Starlase lasers by the Extreme Ultraviolet Lithography System Development Association (EUVA). The lasers will be used to further the research and development specialist’s findings in the field of extreme ultraviolet (EUV) sources.
EUV lithography is now the most promising technology for producing semiconductors of 32nmhp and below. The EUVA will use the POWERLASE lasers to develop new EUV sources for lithography steppers, which are to be used in semiconductor chip fabrication research, by generating 13.5nm extreme ultraviolet (EUV) radiation as a source. POWERLASE Starlase lasers have been selected as a research instrument to produce the high power, high-repetition laser, necessary to produce best-in-class results.
The deal follows a recent purchase of AO2/G lasers by the National Institute of Advanced Industrial Science (AIST) in Japan and a distribution agreement with the Japan Laser Corporation, which allows the promotion of the entire AO Starlase range.
Samir Ellwi, POWERLASE Vice President Strategic Innovations concludes; “We are very pleased EUVA has chosen our lasers to fulfil its research needs. We have worked very hard and we will continue to make sure that EUVA future requirements are met. The deal also demonstrates our continued expansion into the Asian market.”
Powerlase Limited is an innovative, independent, high power Laser Company, focused on Diode Pumped Solid State lasers developed for industrial applications primarily for use in the materials processing and microelectronics markets for flat panel displays, microelectronics, automotive and aerospace sectors.
POWERLASE is supported by venture capital from MTI Partners, Deutsche Venture Capital, Esprit Capital Partners LLP (formerly Cazenove Private Equity), Alice Ventures and FNI Venture Capital.
Powerlase Limited is ranked as the fifth fastest growing venture capital-backed company in the UK in the Daily Telegraph's Business Telegraph Growth Rankings.
The Extreme UltraViolet Lithography System Development Association (EUVA) was formed in June 2002 to develop EUV lithography technologies that would be used to produce 45nmhp semiconductors. Nine companies from the light source, exposure tool and semiconductor sectors gathered to establish EUVA. EUVA was established under the auspices of METI by the law of the mining and manufacturing technology research association. EUVA project is supported by NEDO.
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